Testing for Small-Delay Defects in Nanoscale CMOS Integrated Circuits

Testing for Small-Delay Defects in Nanoscale CMOS Integrated Circuits

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Advances in design methods and process technologies have resulted in a continuous increase in the complexity of integrated circuits (ICs).

However, the increased complexity and nanometer-size features of modern ICs make them susceptible to manufacturing d.

First published
2017
Publishers
Taylor & Francis Group
Subjects
Metal oxide semiconductors·Complementary·Nanotechnology

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